中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films

文献类型:期刊论文

作者Qiao L(乔丽); Wang P(王鹏); Chai LQ(柴利强); Zhang XL(张小龙); Liu WM(刘维民); Wang P(王鹏)
刊名Journal of Physics D: Applied Physics
出版日期2015
卷号48期号:17页码:175304(1-8)
关键词MoS2 films oblique angle deposition surface tribology magnetron sputtering
ISSN号0022-3727
通讯作者王鹏
英文摘要In this study, by adjusting the angle between the incident flux and the normal direction of the substrate's surface, the MoS2 film prepared by magnetron sputtering was used as a model system to study the influence of incident flux angles on the structures and properties of deposited films. The morphological and structural evolutions of MoS2 films deposited at different angles ranging from 0 to 85 degrees were characterized and the corresponding mechanical and tribological properties were evaluated. The results show that a conversion of a continuous film structure to a separate columnar structure with high porosity is found as the incident flux angle increases. Although changing the incident flux angle plays a negligible effect on the crystal preferential orientation of deposited MoS2 films, the mechanical and tribological properties of these films degrade dramatically when the incident flux angle is larger than 60 degrees.
学科主题材料科学与物理化学
收录类别SCI
资助信息the National Natural Science Foundation of China (Grant No: 51227804;11475236)
语种英语
WOS记录号WOS:000353329800015
源URL[http://210.77.64.217/handle/362003/18423]  
专题兰州化学物理研究所_固体润滑国家重点实验室
通讯作者Wang P(王鹏)
作者单位Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式
GB/T 7714
Qiao L,Wang P,Chai LQ,et al. Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films[J]. Journal of Physics D: Applied Physics,2015,48(17):175304(1-8).
APA Qiao L,Wang P,Chai LQ,Zhang XL,Liu WM,&王鹏.(2015).Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films.Journal of Physics D: Applied Physics,48(17),175304(1-8).
MLA Qiao L,et al."Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films".Journal of Physics D: Applied Physics 48.17(2015):175304(1-8).

入库方式: OAI收割

来源:兰州化学物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。