Developments at SSRF in soft X-ray interference lithography
文献类型：期刊论文
| 作者 | Yang, SM; Wang, LS; Zhao, J; Xue, CF; Liu, HG; Xu, ZJ; Wu, YQ; Tai, RZ |
| 刊名 | NUCLEAR SCIENCE AND TECHNIQUES
 |
| 出版日期 | 2015 |
| 卷号 | 26期号:1页码:5—11 |
| 关键词 | INTERFEROMETRIC LITHOGRAPHY GRATINGS BEAM NANOLITHOGRAPHY |
| 英文摘要 | The soft X-ray interference lithography (XIL) branch beamline at Shanghai Synchrotron Radiation Facility (SSRF) is briefly introduced in this article. It is designed for obtaining 1D (line/space) and 2D (dot/hole) periodic nanostructures by using two or more coherent extreme ultraviolet (EUV) beams from an undulator source. A transmission-diffraction-grating type of interferometer is used at the end station. Initial results reveal high performance of the beamline, with 50 nm half-pitch 1D and 2D patterns from a single exposure area of 400 mu m x 400 mu m. XIL is used in a growing number of areas, such as EUV resist test, surface enhanced Raman scattering (SERS) and color filter plasmonic devices. By using highly coherent EUV beam, broadband coherent diffractive imaging can be performed on the XIL beamline. Well reconstructed pinhole of phi 20 mu m has been realized. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/24428]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Yang, SM,Wang, LS,Zhao, J,et al. Developments at SSRF in soft X-ray interference lithography[J]. NUCLEAR SCIENCE AND TECHNIQUES,2015,26(1):5—11. |
| APA | Yang, SM.,Wang, LS.,Zhao, J.,Xue, CF.,Liu, HG.,...&Tai, RZ.(2015).Developments at SSRF in soft X-ray interference lithography.NUCLEAR SCIENCE AND TECHNIQUES,26(1),5—11. |
| MLA | Yang, SM,et al."Developments at SSRF in soft X-ray interference lithography".NUCLEAR SCIENCE AND TECHNIQUES 26.1(2015):5—11. |
入库方式： OAI收割
来源：上海应用物理研究所
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