Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography
文献类型：期刊论文
| 作者 | Zhu, ZC; Wu, S; Xue, CF; Zhao, J; Wang, LS; Wu, YQ; Liu, B; Cheng, CW; Gu, M; Chen, H |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2015 |
| 卷号 | 106期号:24页码:— |
| 关键词 | ATOMIC LAYER DEPOSITION LYSO SCINTILLATOR NANOSPHERES OUTPUT |
| 英文摘要 | Soft-X-ray interference lithography is utilized in combination with atomic layer deposition to prepare photonic crystal structures on the surface of Bi4Ge3O12 (BGO) scintillator in order to extract the light otherwise trapped in the internal of scintillator due to total internal reflection. An enhancement with wavelength-and emergence angle-integration by 95.1% has been achieved. This method is advantageous to fabricate photonic crystal structures with large-area and high-index-contrast which enable a high-efficient coupling of evanescent field and the photonic crystal structures. Generally, the method demonstrated in this work is also suitable for many other light emitting devices where a large-area is required in the practical applications. (C) 2015 AIP Publishing LLC. |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/24454]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Zhu, ZC,Wu, S,Xue, CF,et al. Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography[J]. APPLIED PHYSICS LETTERS,2015,106(24):—. |
| APA | Zhu, ZC.,Wu, S.,Xue, CF.,Zhao, J.,Wang, LS.,...&Tai, RZ.(2015).Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography.APPLIED PHYSICS LETTERS,106(24),—. |
| MLA | Zhu, ZC,et al."Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography".APPLIED PHYSICS LETTERS 106.24(2015):—. |
入库方式： OAI收割
来源：上海应用物理研究所
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