中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma

文献类型:期刊论文

作者Lu, Chen1,2; Fan, Junmei1; Zhang, Yanchang1; Yuan, Fangli1; Yao, Mingshui3
刊名INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY
出版日期2015-09-01
卷号12期号:5页码:939-948
ISSN号1546-542X
英文摘要

Silicon nitride hollow quasi-spheres (SNHQSs) are prepared via a two-step method: producing micrometer-sized agglomerated granules with -Si3N4, and sintering additives of nano-alumina and nano-yttria by spray-drying and then hollowing the spray-dried granules (SDGs) by radio frequency thermal plasma sintering. Five kinds of slurry with different content of sintering additives are prepared for spray-drying, and the attained five kinds of SDGs have similar morphology and properties. However, different SDGs generate diverse hollow structures via plasma sintering. The cavity formation mechanism of the SNHQSs is deeply investigated. In addition, the obtained SNHQSs possess low apparent density (0.371-0.481g/mL), high compressive strength (up to 50MPa), and good thermal stability (up to 1600 degrees C), which will enable their promising applications in porous ceramics.

WOS标题词Science & Technology ; Technology
类目[WOS]Materials Science, Ceramics
研究领域[WOS]Materials Science
关键词[WOS]MECHANICAL-PROPERTIES ; POWDERS ; PARTICLES ; SPHEROIDIZATION ; BETA-SI3N4 ; CERAMICS ; YTTRIA ; FLOW
收录类别SCI
语种英语
WOS记录号WOS:000360979200004
源URL[http://ir.ipe.ac.cn/handle/122111/19533]  
专题过程工程研究所_多相复杂系统国家重点实验室
作者单位1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100190, Peoples R China
3.Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Beijing 100190, Peoples R China
推荐引用方式
GB/T 7714
Lu, Chen,Fan, Junmei,Zhang, Yanchang,et al. Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma[J]. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,2015,12(5):939-948.
APA Lu, Chen,Fan, Junmei,Zhang, Yanchang,Yuan, Fangli,&Yao, Mingshui.(2015).Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma.INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,12(5),939-948.
MLA Lu, Chen,et al."Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma".INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY 12.5(2015):939-948.

入库方式: OAI收割

来源:过程工程研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。