X-RAY-SCATTERING FROM A ROUGH-SURFACE AND DAMAGED LAYER OF POLISHED WAFERS
文献类型：期刊论文
| 作者 | LI M ; MAI ZH ; CUI SF ; LI JH ; GU YS ; WANG YT ; ZHUANG Y |
| 刊名 | journal of physics d-applied physics
 |
| 出版日期 | 1994 |
| 卷号 | 27期号:9页码:1929-1932 |
| ISSN号 | 0022-3727 |
| 通讯作者 | li m chinese acad sciinst physpob 603beijing 100080peoples r china |
| 中文摘要 | theoretical and experimental investigations were performed to show the application of x-ray crystal truncation rod scattering combined with x-ray reflectivity in the measurements of surface roughness and near-surface damage of mechanochemically polished wafers. by fitting the measured crystal truncation rod curves it has been shown that polished wafers are divided into three parts -irregular steps on the surface, a damaged thin layer beneath the surface and a perfect bulk. the results show that the root mean square of the surface roughness of mechanochemically polished fe-doped and/or s-doped inp wafers is one to two atom layers, and that the lateral correlation length of the surface roughness is about 3000-7500 angstrom. the thickness of the damaged region is found to be about 1000 atom layers. |
| 学科主题 | 半导体材料 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-11-15 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/13965]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | LI M,MAI ZH,CUI SF,et al. X-RAY-SCATTERING FROM A ROUGH-SURFACE AND DAMAGED LAYER OF POLISHED WAFERS[J]. journal of physics d-applied physics,1994,27(9):1929-1932. |
| APA | LI M.,MAI ZH.,CUI SF.,LI JH.,GU YS.,...&ZHUANG Y.(1994).X-RAY-SCATTERING FROM A ROUGH-SURFACE AND DAMAGED LAYER OF POLISHED WAFERS.journal of physics d-applied physics,27(9),1929-1932. |
| MLA | LI M,et al."X-RAY-SCATTERING FROM A ROUGH-SURFACE AND DAMAGED LAYER OF POLISHED WAFERS".journal of physics d-applied physics 27.9(1994):1929-1932. |
入库方式： OAI收割
来源：半导体研究所
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