中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Laser SEU sensitivity mapping of deep submicron CMOS SRAM

文献类型:期刊论文

作者Yu, Yongtao; Feng, Guoqiang; Chen, Rui; Han, Jianwei
刊名Journal of Semiconductors
出版日期2014
卷号35期号:6
ISSN号1674-4926
通讯作者Yu, Y. (yuyongtao10@mails.ucas.ac.cn)
英文摘要The pulsed laser facility for SEU sensitivity mapping is utilized to study the SEU sensitive regions of a 0.18 μm CMOS SRAM cell. Combined with the device layout micrograph, SEU sensitivity maps of the SRAM cell are obtained. TCAD simulation work is performed to examine the SEU sensitivity characteristics of the SRAM cell. The laser mapping experiment results are discussed and compared with the electron micrograph information of the SRAM cell and the TCAD simulation results. The results present that the test technique is reliable and of high mapping precision for the deep submicron technology device. © 2014 Chinese Institute of Electronics.
收录类别EI
语种英语
源URL[http://ir.nssc.ac.cn/handle/122/4368]  
专题国家空间科学中心_保障部/保障与试验验证中心
推荐引用方式
GB/T 7714
Yu, Yongtao,Feng, Guoqiang,Chen, Rui,et al. Laser SEU sensitivity mapping of deep submicron CMOS SRAM[J]. Journal of Semiconductors,2014,35(6).
APA Yu, Yongtao,Feng, Guoqiang,Chen, Rui,&Han, Jianwei.(2014).Laser SEU sensitivity mapping of deep submicron CMOS SRAM.Journal of Semiconductors,35(6).
MLA Yu, Yongtao,et al."Laser SEU sensitivity mapping of deep submicron CMOS SRAM".Journal of Semiconductors 35.6(2014).

入库方式: OAI收割

来源:国家空间科学中心

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