中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY

文献类型:期刊论文

作者DUAN XF ; FUNG KK ; CHU YM ; SHENG C ; ZHOU GL
刊名philosophical magazine letters
出版日期1991
卷号63期号:2页码:79-85
关键词MULTILAYERS HETEROSTRUCTURES
ISSN号0950-0839
通讯作者duan xf chinese acad scibeijing lab electr microscopypob 2724beijing 100080peoples r china
中文摘要side bands due to purely composition and combined composition-strain modulation in plan-view specimens of a nominally ge0.5si0.5(5nm)/si(25nm) superlattice have been obtained by large-angle convergent-beam electron diffraction. the intensities of the side bands have been calculated from a periodic tension-compression model of the superlattice bilayer using the kinematical theory of electron diffraction. accurate values of elastic strains in the bilayer and of the ge content can be obtained in this way.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-15
源URL[http://ir.semi.ac.cn/handle/172111/14323]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
DUAN XF,FUNG KK,CHU YM,et al. CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY[J]. philosophical magazine letters,1991,63(2):79-85.
APA DUAN XF,FUNG KK,CHU YM,SHENG C,&ZHOU GL.(1991).CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY.philosophical magazine letters,63(2),79-85.
MLA DUAN XF,et al."CONVERGENT-BEAM ELECTRON-DIFFRACTION STUDY OF GE0.5SI0.5/SI STRAINED-LAYER SUPERLATTICES GROWN BY MOLECULAR-BEAM EPITAXY".philosophical magazine letters 63.2(1991):79-85.

入库方式: OAI收割

来源:半导体研究所

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