中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electron diffraction and photoemission studies of clean and water-covered Si(5,5,12) and Si(112) surfaces

文献类型:期刊论文

作者Ranke W ; Xing YR
刊名surface review and letters
出版日期1997
卷号4期号:1页码:15-23
关键词SCANNING-TUNNELING-MICROSCOPY MILLER INDEX SURFACES ATOMIC-STRUCTURE ADSORPTION SILICON H2O LEED SI MODEL
ISSN号0218-625x
通讯作者ranke w max planck gesellfritz haber instfaradayweg 4-6d-14195 berlingermany.
中文摘要the structure of silicon surfaces in the orientation range (113)-(5,5,12)-(337)-(112) has been investigated using high resolution leed and photoemission both on a spherical and on flat samples. we find that si(5,5,12) [5.3 degrees from (113) and 0.7 degrees from (937)] is the only stable orientation between (113) and (111) and confirm the result of baski et al. [science 269, 1556 (1995)] that it has a 2 x 1 superstructure with a very large unit cell of 7.68 x 53.5 angstrom(2). adsorption measurements of water on si(5,5,12) yield a mobile precursor kinetics with two kinds of regions saturating at 0.25 and 0.15 ml which are related to adsorption on different sites. using these results, a modified structure model is proposed. surfaces between (113) and (5,5,12) separate into facets of these two orientations; between (5,5,12) and (112), they separate into (5,5,12) and (111) facets. (337) facets in this range may be considered as defective (5,5,12) facets.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-11-17
源URL[http://ir.semi.ac.cn/handle/172111/15211]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Ranke W,Xing YR. Electron diffraction and photoemission studies of clean and water-covered Si(5,5,12) and Si(112) surfaces[J]. surface review and letters,1997,4(1):15-23.
APA Ranke W,&Xing YR.(1997).Electron diffraction and photoemission studies of clean and water-covered Si(5,5,12) and Si(112) surfaces.surface review and letters,4(1),15-23.
MLA Ranke W,et al."Electron diffraction and photoemission studies of clean and water-covered Si(5,5,12) and Si(112) surfaces".surface review and letters 4.1(1997):15-23.

入库方式: OAI收割

来源:半导体研究所

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