中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Properties of GaAs single crystals grown by molecular beam epitaxy at low temperatures

文献类型:期刊论文

作者Chen NF ; He HJ ; Wang YT ; Lin LY
刊名science in china series a-mathematics physics astronomy
出版日期1997
卷号40期号:2页码:214-218
关键词low temperature molecular beam epitaxy GaAs single crystal lattice parameter arsenic interstitial couples arsenic precipitates effects of backgating or sidegating LAYERS DEPENDENCE
ISSN号1006-9283
通讯作者chen nf chinese acad sciinst semicondbeijing 100083peoples r china.
中文摘要properties of gaas single crystals grown at low temperatures by molecular beam epitaxy (ltmbe gaas) have been studied. the results shaw that excessive arsenic atoms of about 10(20) cm(-3) exist in ltmbe gaas in the form of arsenic interstitial couples, and cause the dilation in lattice parameter of ltmbe gaas, the arsenic interstitial couples will be decomposed, and the excessive arsenic atoms will precipitate during the annealing above 300 degrees c. arsenic precipitates accumulate in the junctions of epilayers with the increase in the temperature of annealing. the depletion regions caused by arsenic precipitates overlap each other in ltmbe gaas, taking on the character of high resistivity, and the effects of backgating or sidegating are effectively restrained.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-17
源URL[http://ir.semi.ac.cn/handle/172111/15281]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Chen NF,He HJ,Wang YT,et al. Properties of GaAs single crystals grown by molecular beam epitaxy at low temperatures[J]. science in china series a-mathematics physics astronomy,1997,40(2):214-218.
APA Chen NF,He HJ,Wang YT,&Lin LY.(1997).Properties of GaAs single crystals grown by molecular beam epitaxy at low temperatures.science in china series a-mathematics physics astronomy,40(2),214-218.
MLA Chen NF,et al."Properties of GaAs single crystals grown by molecular beam epitaxy at low temperatures".science in china series a-mathematics physics astronomy 40.2(1997):214-218.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。