中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation and microstructure of p-type transparent conducting Ga-doped SnO_2 thin films grown by rf magnetron sputtering

文献类型:期刊论文

作者Yang TY(杨铁莹); Qin XB(秦秀波); Wang HH(王焕华); Tieying Yang; Xiubo Qin; Huanhua Wang; Quanjie Jia; Runsheng Yu; Baoyi Wang; Jiaou Wang
出版日期2009
页码6
关键词Ga-doped SnO_2 p-type transparent conducting oxide rf magnetron sputtering microstructure
通讯作者王焕华
英文摘要Transparent p-type conducting Ga-doped SnO_2 thin films were successfully prepared using reactive rf magnetron sputtering.The typical resistivity,hall mobility,hole concentrations and hall coefficient are 3.192×10~(-3)Ωcm,2.75×10~2 cm~2V~(-1)S~(-1),7.131×10~(18) cm~(-3),8.746×10~(-1)cm~3C~(-1), r...
公开日期2016-02-25
源URL[http://ir.ihep.ac.cn/handle/311005/223248]  
专题高能物理研究所_多学科研究中心
推荐引用方式
GB/T 7714
Yang TY,Qin XB,Wang HH,et al. Preparation and microstructure of p-type transparent conducting Ga-doped SnO_2 thin films grown by rf magnetron sputtering[J],2009:6.
APA 杨铁莹.,秦秀波.,王焕华.,Tieying Yang.,Xiubo Qin.,...&姜晓明.(2009).Preparation and microstructure of p-type transparent conducting Ga-doped SnO_2 thin films grown by rf magnetron sputtering.,6.
MLA 杨铁莹,et al."Preparation and microstructure of p-type transparent conducting Ga-doped SnO_2 thin films grown by rf magnetron sputtering".(2009):6.

入库方式: OAI收割

来源:高能物理研究所

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