中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Characterization and improvement of GaAs layers grown on Si using an ultrathin a-Si film as a buffer layer

文献类型:期刊论文

作者Hao MS ; Shao CL ; Soga T ; Jimbo T ; Umeno M ; Liang JW ; Zheng LX ; Xiao ZB ; Xiao JF
刊名japanese journal of applied physics part 2-letters
出版日期1996
卷号35期号:8a页码:l960-l963
关键词GaAs/Si epilayer a-Si buffer layer deep level MOCVD DISLOCATION DENSITY
ISSN号0021-4922
通讯作者hao ms nagoya inst technoldept elect & comp engnshowa kugokiso chonagoyaaichi 466japan.
中文摘要gaas epilayers grown on si by metalorganic chemical vapor deposition (mocvd) using an ultrathin a-si buffer layer were characterized by deep-level transient spectroscopy (dlts). six electron traps with activation energies of 0.79, 0.67, 0.61, 0.55, 0.53 and 0.32 ev below the conduction band were determined by fitting the experimental spectra. two of the levels, c (0.61 ev) and f (0.32 ev), were first detected in gaas epilayers on si and identified as the metastable defects m3 and m4, respectively. in order to improve the quality of gaas/si epilayers, another gaas layer was grown on the gaas/si epilayers grown using mocvd. the deep levels in this regrown gaas epilayer were also studied using dlts. only the el2 level was found in the regrown gaas epilayers. these results show that the quality of the gaas epilayer was greatly improved by applying this growth process.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-17
源URL[http://ir.semi.ac.cn/handle/172111/15375]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Hao MS,Shao CL,Soga T,et al. Characterization and improvement of GaAs layers grown on Si using an ultrathin a-Si film as a buffer layer[J]. japanese journal of applied physics part 2-letters,1996,35(8a):l960-l963.
APA Hao MS.,Shao CL.,Soga T.,Jimbo T.,Umeno M.,...&Xiao JF.(1996).Characterization and improvement of GaAs layers grown on Si using an ultrathin a-Si film as a buffer layer.japanese journal of applied physics part 2-letters,35(8a),l960-l963.
MLA Hao MS,et al."Characterization and improvement of GaAs layers grown on Si using an ultrathin a-Si film as a buffer layer".japanese journal of applied physics part 2-letters 35.8a(1996):l960-l963.

入库方式: OAI收割

来源:半导体研究所

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