中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS

文献类型:期刊论文

作者LUO CP ; CHIN MK ; YUAN Z ; XU ZY ; YANG XP ; ZHANG PH
刊名journal of crystal growth
出版日期1995
卷号155期号:0页码:272-275
关键词SEMICONDUCTOR INTERFACES ROUGHNESS SCATTERING
ISSN号0022-0248
通讯作者luo cp nanyang technol univsch elect & electr engnnanyang avesingapore 2263singapore.
中文摘要growth interruption-induced microroughness is studied by photoluminescence (pl) of single quantum wells with different well widths and interruption times. analysis of the peak splitting in the pl spectra shows that the adjacent peak splittings correspond to well width differences smaller than one monolayer. the number of split peaks increases with increasing well width, saturating when the well width exceeds 11 monolayers. this trend correlates well with the decrease in the lateral dimension of the exciton, which corresponds roughly to the minimum optically sampled area of the interface. for a given quantum well, a plot of the normalized integrated intensities of the split pl peaks versus the well width fluctuation is well described by a gaussian distribution with an average fluctuation smaller than one monolayer. these results are consistent with the microroughness model.
英文摘要growth interruption-induced microroughness is studied by photoluminescence (pl) of single quantum wells with different well widths and interruption times. analysis of the peak splitting in the pl spectra shows that the adjacent peak splittings correspond to well width differences smaller than one monolayer. the number of split peaks increases with increasing well width, saturating when the well width exceeds 11 monolayers. this trend correlates well with the decrease in the lateral dimension of the exciton, which corresponds roughly to the minimum optically sampled area of the interface. for a given quantum well, a plot of the normalized integrated intensities of the split pl peaks versus the well width fluctuation is well described by a gaussian distribution with an average fluctuation smaller than one monolayer. these results are consistent with the microroughness model.; 于2010-11-17批量导入; zhangdi于2010-11-17 14:17:05导入数据到semi-ir的ir; made available in dspace on 2010-11-17t06:17:05z (gmt). no. of bitstreams: 1 7080.pdf: 290182 bytes, checksum: 6bf01496a86f00dbff9db7d4f0405e58 (md5) previous issue date: 1995; acad sinica,inst semicond,natl lab superlattices & microstruct,beijing 100083,peoples r china
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-17 ; 2011-04-28
源URL[http://ir.semi.ac.cn/handle/172111/15491]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
LUO CP,CHIN MK,YUAN Z,et al. GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS[J]. journal of crystal growth,1995,155(0):272-275.
APA LUO CP,CHIN MK,YUAN Z,XU ZY,YANG XP,&ZHANG PH.(1995).GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS.journal of crystal growth,155(0),272-275.
MLA LUO CP,et al."GROWTH INTERRUPTION INDUCED INTERFACE MICROROUGHNESS IN SINGLE QUANTUM-WELLS".journal of crystal growth 155.0(1995):272-275.

入库方式: OAI收割

来源:半导体研究所

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