中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
INPLANE X-RAY-SCATTERING OF EPITAXIAL STRUCTURES

文献类型:期刊论文

作者CUI SF ; WANG YT ; ZHUANG Y ; LI M ; MAI ZH
刊名journal of crystal growth
出版日期1995
卷号152期号:4页码:354-358
关键词STRAIN RELAXATION HETEROEPITAXIAL LAYERS DEVICE STRUCTURES ROCKING CURVES SUPERLATTICES DIFFRACTION HETEROSTRUCTURES MISFIT
ISSN号0022-0248
通讯作者cui sf chinese acad sciinst physbeijing 100080peoples r china.
中文摘要a new approach for in-plane x-ray scattering from the cleavages of epitaxial films or superlattices, where the scattering vectors are parallel to the interfaces, is proposed. this method can be employed to determine directly the in-plane x-ray strains and other atomic registry along the interfaces of the epitaxial structures.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-17
源URL[http://ir.semi.ac.cn/handle/172111/15525]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
CUI SF,WANG YT,ZHUANG Y,et al. INPLANE X-RAY-SCATTERING OF EPITAXIAL STRUCTURES[J]. journal of crystal growth,1995,152(4):354-358.
APA CUI SF,WANG YT,ZHUANG Y,LI M,&MAI ZH.(1995).INPLANE X-RAY-SCATTERING OF EPITAXIAL STRUCTURES.journal of crystal growth,152(4),354-358.
MLA CUI SF,et al."INPLANE X-RAY-SCATTERING OF EPITAXIAL STRUCTURES".journal of crystal growth 152.4(1995):354-358.

入库方式: OAI收割

来源:半导体研究所

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