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Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography
文献类型：期刊论文
| 作者 | Luo, Jun1; Zeng, Bo1; Wang, Changtao1; Gao, Ping1; Liu, Kaipeng1; Pu, Mingbo1; Jin, Jinjin1; Zhao, Zeyu1; Li, Xiong1; Yu, Honglin2 |
| 刊名 | NANOSCALE
 |
| 出版日期 | 2015 |
| 卷号 | 7期号:44页码:18805-18812 |
| ISSN号 | 2040-3364 |
| 英文摘要 | Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm x 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated meta-surface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nano-structures of holograms, vortex phase plates, bio-sensors and solar cells etc. |
| WOS标题词 | Science & Technology ; Physical Sciences ; Technology |
| 类目[WOS] | Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied |
| 研究领域[WOS] | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 关键词[WOS] | EVANESCENT NEAR-FIELD ; OPTICAL LITHOGRAPHY ; SILVER SUPERLENS ; VISIBLE-LIGHT ; REFRACTION ; SURFACE ; POLARITONS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000364824000050 |
| 公开日期 | 2016-02-26 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3769]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China 2.Chongqing Univ, Key Lab Optoelect Technol & Syst, Minist Educ, Chongqing 400030, Peoples R China |
| 推荐引用方式 GB/T 7714 | Luo, Jun,Zeng, Bo,Wang, Changtao,et al. Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography[J]. NANOSCALE,2015,7(44):18805-18812. |
| APA | Luo, Jun.,Zeng, Bo.,Wang, Changtao.,Gao, Ping.,Liu, Kaipeng.,...&Luo, Xiangang.(2015).Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography.NANOSCALE,7(44),18805-18812. |
| MLA | Luo, Jun,et al."Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography".NANOSCALE 7.44(2015):18805-18812. |
入库方式： OAI收割
来源：光电技术研究所
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