以甲烷为先驱气体通过中频磁控溅射Ti80Si20靶材在硅和不锈钢基底上制备TiSi-C:H薄膜,研究了甲烷流量对薄膜沉积速率、结构、力学和摩擦学性能的影响。结果表明,甲烷流量对薄膜结构、力学和摩擦学性能有显著影响,随甲烷流量增加薄膜从包含约10 nm晶的锥状纳米晶/非晶复合结构向非晶结构转变,在低甲烷流量下沉积的薄膜具有高硬度、高应力和高磨损率;在高甲烷流量下薄膜硬度和应力降低,而摩擦学性能提高。薄膜力学和摩擦学性能的变化被认为是随甲烷流量增加薄膜结构演化的结果。 更多还原

The TiSi-C:H films were deposited on the silicon and the stainless steel substrates by middle-frequency magnetron sputtering Ti80Si20 targets using the methane gas as the precursor. The effects of the methane flow rate on the deposition rate, the structure, the mechanical and tribological properties were investigated. The results demonstrate that the structure, the mechanical and tribological properties of the films strongly depend on the methane flow rate. The deposited films exhibit a transition from a tapered columnar nanocomposite structure consisting of similar to 10 nm nanocrystallites and amorphous phases to an amorphous structure with increasing of methane flow rate. The films deposited at a low methane flow rate show high hardness, high internal stress and high wear rates, whereas the films deposited at high methane flow rate show a decrease in hardness and internal stress but an improvement in tribological performance. The variations on the mechanical and tribological properties may be attributed to the evolution of the microstructures of the films with increasing of methane flow rate.