中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Material Growth and Device Fabrication of GaAs Based 1.3μm GaInNAs Quantum Well Laser Diodes

文献类型:期刊论文

作者Xu Yingqiang; Yang Xiaohong; Xu Yingqiang; Han Qin; Niu Zhichuan; Wu Donghai; Peng Hongling
刊名半导体学报
出版日期2005
卷号26期号:9页码:1860-1864
中文摘要Material growth and device fabrication of the first 1.3μm quantum well (QW) edge emitting laser diodes in China are reported. Through the optimization of the molecular beam epitaxy (MBE) growth conditions and the tuning of the indium and nitrogen composition of the GalnNAs QWs, the emission wavelengths of the QWs can be tuned to 1.3μm. Ridge geometry waveguide laser diodes are fabricated. The lasing wavelength is 1.3μm under continuous current injection at room temperature with threshold current of 1kA/cm^2 for the laser diode structures with the cleaved facet mirrors. The output light power over 30mW is obtained.
学科主题半导体物理
资助信息国家自然科学基金,国家高技术研究发展计划,国家重点基础研究专项资助项目
收录类别CSCD
语种英语
公开日期2010-11-23
源URL[http://ir.semi.ac.cn/handle/172111/16791]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Xu Yingqiang,Yang Xiaohong,Xu Yingqiang,et al. Material Growth and Device Fabrication of GaAs Based 1.3μm GaInNAs Quantum Well Laser Diodes[J]. 半导体学报,2005,26(9):1860-1864.
APA Xu Yingqiang.,Yang Xiaohong.,Xu Yingqiang.,Han Qin.,Niu Zhichuan.,...&Peng Hongling.(2005).Material Growth and Device Fabrication of GaAs Based 1.3μm GaInNAs Quantum Well Laser Diodes.半导体学报,26(9),1860-1864.
MLA Xu Yingqiang,et al."Material Growth and Device Fabrication of GaAs Based 1.3μm GaInNAs Quantum Well Laser Diodes".半导体学报 26.9(2005):1860-1864.

入库方式: OAI收割

来源:半导体研究所

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