Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip
文献类型：期刊论文
| 作者 | Wang Wei; Wang Wei; Yang Hua
|
| 刊名 | 半导体学报
 |
| 出版日期 | 2005 |
| 卷号 | 26期号:7页码:1287-1290 |
| 中文摘要 | a new fabricating method is demonstrated to realize two different bragg gratings in an identical chip using traditional holographic exposure. polyimide is used to protect one bragg grating during the first period. the technical process of this method is as simple as that of standard holographic exposure |
| 英文摘要 | a new fabricating method is demonstrated to realize two different bragg gratings in an identical chip using traditional holographic exposure. polyimide is used to protect one bragg grating during the first period. the technical process of this method is as simple as that of standard holographic exposure; 于2010-11-23批量导入; zhangdi于2010-11-23 13:04:22导入数据到semi-ir的ir; made available in dspace on 2010-11-23t05:04:23z (gmt). no. of bitstreams: 1 4456.pdf: 324894 bytes, checksum: 541e9744a39838fc1c9f65f30e340f00 (md5) previous issue date: 2005; 国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目; institute of semiconductors, chinese academy of sciences |
| 学科主题 | 半导体材料 |
| 收录类别 | CSCD |
| 资助信息 | 国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目 |
| 语种 | 英语 |
| 公开日期 | 2010-11-23 ; 2011-04-29 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/16955]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Wang Wei,Wang Wei,Yang Hua. Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip[J]. 半导体学报,2005,26(7):1287-1290. |
| APA | Wang Wei,Wang Wei,&Yang Hua.(2005).Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip.半导体学报,26(7),1287-1290. |
| MLA | Wang Wei,et al."Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip".半导体学报 26.7(2005):1287-1290. |
入库方式： OAI收割
来源：半导体研究所
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