中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fabrication of 1.55μm Si-Based Resonant Cavity Enhanced Photodetectors

文献类型:期刊论文

作者Cheng Buwen; Zuo Yuhua
刊名半导体学报
出版日期2005
卷号26期号:2页码:271-275
中文摘要A novel bonding method using silicate gel as bonding medium is developed.High reflective SiO2/Si mirrors deposited on silicon substrates by e-beam deposition are bonded to the active layers at a low temperature of 350℃ without any special treatment on bonding surfaces.The reflectivities of the mirrors can be as high as 99.9%.A Si-based narrow band response InGaAs photodetector is successfully fabricated,with a quantum efficiency of 22.6% at the peak wavelength of 1.54μm,and a full width at half maximum of about 27nm.This method has a great potential for industry processes.
英文摘要A novel bonding method using silicate gel as bonding medium is developed.High reflective SiO2/Si mirrors deposited on silicon substrates by e-beam deposition are bonded to the active layers at a low temperature of 350℃ without any special treatment on bonding surfaces.The reflectivities of the mirrors can be as high as 99.9%.A Si-based narrow band response InGaAs photodetector is successfully fabricated,with a quantum efficiency of 22.6% at the peak wavelength of 1.54μm,and a full width at half maximum of about 27nm.This method has a great potential for industry processes.; 于2010-11-23批量导入; zhangdi于2010-11-23 13:05:06导入数据到SEMI-IR的IR; Made available in DSpace on 2010-11-23T05:05:06Z (GMT). No. of bitstreams: 1 4561.pdf: 235568 bytes, checksum: e6e8fd44730f7e49f1f60f77481ed71d (MD5) Previous issue date: 2005; 国家重点基础研究发展规划,国家自然科学基金,国家高技术研究发展计划; Institute of Semiconductors, Chinese Academy of Sciences;Beijing Chemical Plant
学科主题光电子学
收录类别CSCD
资助信息国家重点基础研究发展规划,国家自然科学基金,国家高技术研究发展计划
语种英语
公开日期2010-11-23 ; 2011-04-29
源URL[http://ir.semi.ac.cn/handle/172111/17143]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Cheng Buwen,Zuo Yuhua. Fabrication of 1.55μm Si-Based Resonant Cavity Enhanced Photodetectors[J]. 半导体学报,2005,26(2):271-275.
APA Cheng Buwen,&Zuo Yuhua.(2005).Fabrication of 1.55μm Si-Based Resonant Cavity Enhanced Photodetectors.半导体学报,26(2),271-275.
MLA Cheng Buwen,et al."Fabrication of 1.55μm Si-Based Resonant Cavity Enhanced Photodetectors".半导体学报 26.2(2005):271-275.

入库方式: OAI收割

来源:半导体研究所

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