Design and numerical analysis for low birefringence silica on silicon waveguides
文献类型：期刊论文
| 作者 | Li Jian ; An Junming
|
| 刊名 | chinese optics letters
 |
| 出版日期 | 2004 |
| 卷号 | 2期号:8页码:456-458 |
| 中文摘要 | a new fabrication technology for three-dimensionally buried silica on silicon optical waveguide based on deep etching and thermal oxidation is presented. using this method, a silicon layer is left at the side of waveguide. the stress distribution and effective refractive index are calculated by using finite element method and finite different beam propagation method, respectively. the results indicate that the stress of silica on silicon optical waveguide fabricated by this method can be matched in parallel and vertical directions and stress birefringence can be effectively reduced due to the side-silicon layer. |
| 英文摘要 | a new fabrication technology for three-dimensionally buried silica on silicon optical waveguide based on deep etching and thermal oxidation is presented. using this method, a silicon layer is left at the side of waveguide. the stress distribution and effective refractive index are calculated by using finite element method and finite different beam propagation method, respectively. the results indicate that the stress of silica on silicon optical waveguide fabricated by this method can be matched in parallel and vertical directions and stress birefringence can be effectively reduced due to the side-silicon layer.; 于2010-11-23批量导入; zhangdi于2010-11-23 13:05:39导入数据到semi-ir的ir; made available in dspace on 2010-11-23t05:05:39z (gmt). no. of bitstreams: 1 4641.pdf: 362999 bytes, checksum: 60a50b247666f144631b4e606272684b (md5) previous issue date: 2004; r&d center of optoelectonics, institute of semiconductors, chinese academy of sciences |
| 学科主题 | 光电子学 |
| 收录类别 | CSCD |
| 语种 | 英语 |
| 公开日期 | 2010-11-23 ; 2011-04-29 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/17251]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Li Jian,An Junming. Design and numerical analysis for low birefringence silica on silicon waveguides[J]. chinese optics letters,2004,2(8):456-458. |
| APA | Li Jian,&An Junming.(2004).Design and numerical analysis for low birefringence silica on silicon waveguides.chinese optics letters,2(8),456-458. |
| MLA | Li Jian,et al."Design and numerical analysis for low birefringence silica on silicon waveguides".chinese optics letters 2.8(2004):456-458. |
入库方式： OAI收割
来源：半导体研究所
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