Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design
文献类型：期刊论文
| 作者 | An Junming ; Li Jian
|
| 刊名 | 半导体学报
 |
| 出版日期 | 2004 |
| 卷号 | 25期号:11页码:1360-1363 |
| 中文摘要 | a new technology for fabrication of silica on silicon arrayed waveguide grating (awg) based on deep etching and thermal oxidation is presented.using this method,a silicon layer is remained at the side of waveguide.the stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.the results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and awg polarization dependent wavelength (pdλ) can be reduced effectively due to side-silicon layer. |
| 英文摘要 | a new technology for fabrication of silica on silicon arrayed waveguide grating (awg) based on deep etching and thermal oxidation is presented.using this method,a silicon layer is remained at the side of waveguide.the stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.the results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and awg polarization dependent wavelength (pdλ) can be reduced effectively due to side-silicon layer.; 于2010-11-23批量导入; zhangdi于2010-11-23 13:05:47导入数据到semi-ir的ir; made available in dspace on 2010-11-23t05:05:47z (gmt). no. of bitstreams: 1 4662.pdf: 393327 bytes, checksum: adbe4d0bfefdf05b8f6a12935d0b9e1e (md5) previous issue date: 2004; 国家重点基础研究发展规划,国家高技术研究发展计划,国家自然科学基金; r&d center for optoelectonics,institute of semiconductors,the chinese academy of sciences |
| 学科主题 | 光电子学 |
| 收录类别 | CSCD |
| 资助信息 | 国家重点基础研究发展规划,国家高技术研究发展计划,国家自然科学基金 |
| 语种 | 英语 |
| 公开日期 | 2010-11-23 ; 2011-04-29 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/17291]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | An Junming,Li Jian. Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design[J]. 半导体学报,2004,25(11):1360-1363. |
| APA | An Junming,&Li Jian.(2004).Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design.半导体学报,25(11),1360-1363. |
| MLA | An Junming,et al."Polarization-Insensitive Silica on Silicon Arrayed Waveguide Grating Design".半导体学报 25.11(2004):1360-1363. |
入库方式： OAI收割
来源：半导体研究所
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