Influence of growth and annealing temperature on the strain and surface morphology of Ge995Sn0.005 epilayer
文献类型：期刊论文
| ; | |
| 作者 | Su Shaojian; Zhang Dongliang; Xue Chunlai; Cheng Buwen |
| 刊名 | applied surface science
 ; Applied Surface Science
|
| 出版日期 | 2015 ; 2015 |
| 卷号 | 340页码:132-137. |
| 学科主题 | 光电子学 ; 光电子学 |
| 收录类别 | SCI |
| 语种 | 英语 ; 英语 |
| 公开日期 | 2016-02-16 ; 2016-02-16 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/26637]  |
| 专题 | 半导体研究所_光电子研究发展中心 |
| 推荐引用方式 GB/T 7714 | Su Shaojian,Zhang Dongliang,Xue Chunlai,et al. Influence of growth and annealing temperature on the strain and surface morphology of Ge995Sn0.005 epilayer, Influence of growth and annealing temperature on the strain and surface morphology of Ge995Sn0.005 epilayer[J]. applied surface science, Applied Surface Science,2015, 2015,340, 340:132-137., 132-137.. |
| APA | Su Shaojian,Zhang Dongliang,Xue Chunlai,&Cheng Buwen.(2015).Influence of growth and annealing temperature on the strain and surface morphology of Ge995Sn0.005 epilayer.applied surface science,340,132-137.. |
| MLA | Su Shaojian,et al."Influence of growth and annealing temperature on the strain and surface morphology of Ge995Sn0.005 epilayer".applied surface science 340(2015):132-137.. |
入库方式： OAI收割
来源：半导体研究所
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