Simulation and experimental study of aspect ratio limitation in Fresnel zone plates for hard-x-ray optics
文献类型：期刊论文
| 作者 | Liu, JP; Shao, JH; Zhang, SC; Ma, YQ; Taksatorn, N; Mao, CW; Chen, YF; Deng, BA; Xiao, TQ |
| 刊名 | APPLIED OPTICS
 |
| 出版日期 | 2015 |
| 卷号 | 54期号:32页码:9630—9636 |
| 关键词 | ELECTRON-BEAM LITHOGRAPHY HIGH-EFFICIENCY RESOLUTION FABRICATION MICROSCOPY RESIST |
| ISSN号 | 1559-128X |
| 通讯作者 | Chen, YF (reprint author), Fudan Univ, Sch Informat Sci & Engn, State Key Lab ASIC & Syst, Nanolithog & Applicat Res Grp, Shanghai 200433, Peoples R China. |
| 英文摘要 | For acquiring high-contrast and high-brightness images in hard-x-ray optics, Fresnel zone plates with high aspect ratios (zone height/zone width) have been constantly pursued. However, knowledge of aspect ratio limits remains limited. This work explores the achievable aspect ratio limit in polymethyl methacrylate (PMMA) by electronbeam lithography (EBL) under 100 keV, and investigates the lithographic factors for this limitation. Both Monte Carlo simulation and EBL on thick PMMA are applied to investigate the profile evolution with exposure doses over 100 nm wide dense zones. A high-resolution scanning electron microscope at low acceleration mode for charging free is applied to characterize the resultant zone profiles. It was discovered for what we believe is the first time that the primary electron-beam spreading in PMMA and the proximity effect due to extra exposure from neighboring areas could be the major causes of limiting the aspect ratio. Using the optimized lithography condition, a 100 nm zone plate with aspect ratio of 15/1 was fabricated and its focusing property was characterized at the Shanghai Synchrotron Radiation Facility. The aspect ratio limit found in this work should be extremely useful for guiding further technical development in nanofabrication of high-quality Fresnel zone plates. (C) 2015 Optical Society of America |
| 语种 | 英语 |
| WOS记录号 | WOS:000364456300037 |
| 公开日期 | 2016-03-08 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/25041]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Liu, JP,Shao, JH,Zhang, SC,et al. Simulation and experimental study of aspect ratio limitation in Fresnel zone plates for hard-x-ray optics[J]. APPLIED OPTICS,2015,54(32):9630—9636. |
| APA | Liu, JP.,Shao, JH.,Zhang, SC.,Ma, YQ.,Taksatorn, N.,...&Xiao, TQ.(2015).Simulation and experimental study of aspect ratio limitation in Fresnel zone plates for hard-x-ray optics.APPLIED OPTICS,54(32),9630—9636. |
| MLA | Liu, JP,et al."Simulation and experimental study of aspect ratio limitation in Fresnel zone plates for hard-x-ray optics".APPLIED OPTICS 54.32(2015):9630—9636. |
入库方式： OAI收割
来源：上海应用物理研究所
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