中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Heteroepitaxial Growth and Heterojunction Characteristics of Voids-Free n-3C-SiC on p-Si(100)

文献类型:期刊论文

作者Sun Guosheng ; Sun Yanling ; Wang Lei ; Zhao Wanshun ; Luo Muchang ; Zhang Yongxing ; Zeng Yiping ; Li Jinmin ; Lin Lanying
刊名半导体学报
出版日期2003
卷号24期号:6页码:567-573
中文摘要highly oriented voids-free 3c-sic heteroepitaxial layers are grown on φ50mm si (100) substrates by low pressure chemical vapor deposition (lpcvd). the initial stage of carbonization and the surface morphology of carbonization layers of si(100) are studied using reflection high energy electron diffraction (rheed) and scanning electron microscopy (sem). it is shown that the optimized carbonization temperature for the growth of voids-free 3s-sic on si (100) substrates is 1100 ℃. the electrical properties of sic layers are characterized using van der pauw method. the i-v, c-v, and the temperature dependence of i-v characteristics in n-3c-sic-p-si heterojunctions with augeni and al electrical pads are investigated. it is shown that the maximum reverse breakdown voltage of the n-3c-sic-p-si heterojunction diodes reaches to 220v at room temperature. these results indicate that the sic/si heterojunction diode can be used to fabricate the wide bandgap emitter sic/si heterojunction bipolar transistors (hbt's).
英文摘要highly oriented voids-free 3c-sic heteroepitaxial layers are grown on φ50mm si (100) substrates by low pressure chemical vapor deposition (lpcvd). the initial stage of carbonization and the surface morphology of carbonization layers of si(100) are studied using reflection high energy electron diffraction (rheed) and scanning electron microscopy (sem). it is shown that the optimized carbonization temperature for the growth of voids-free 3s-sic on si (100) substrates is 1100 ℃. the electrical properties of sic layers are characterized using van der pauw method. the i-v, c-v, and the temperature dependence of i-v characteristics in n-3c-sic-p-si heterojunctions with augeni and al electrical pads are investigated. it is shown that the maximum reverse breakdown voltage of the n-3c-sic-p-si heterojunction diodes reaches to 220v at room temperature. these results indicate that the sic/si heterojunction diode can be used to fabricate the wide bandgap emitter sic/si heterojunction bipolar transistors (hbt's).; 于2010-11-23批量导入; zhangdi于2010-11-23 13:07:35导入数据到semi-ir的ir; made available in dspace on 2010-11-23t05:07:35z (gmt). no. of bitstreams: 1 4977.pdf: 280197 bytes, checksum: cb23c5bf659bda1b7905de638df01ee1 (md5) previous issue date: 2003; 国家重点基础研究发展规划(no.g2 683),国家高技术研究发展计划(no.2 1aa311 9 )资助项目; institute of semiconductors, the chineses academy of sciences
学科主题半导体材料
收录类别CSCD
资助信息国家重点基础研究发展规划(no.g2 683),国家高技术研究发展计划(no.2 1aa311 9 )资助项目
语种中文
公开日期2010-11-23 ; 2011-04-29
源URL[http://ir.semi.ac.cn/handle/172111/17861]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Sun Guosheng,Sun Yanling,Wang Lei,et al. Heteroepitaxial Growth and Heterojunction Characteristics of Voids-Free n-3C-SiC on p-Si(100)[J]. 半导体学报,2003,24(6):567-573.
APA Sun Guosheng.,Sun Yanling.,Wang Lei.,Zhao Wanshun.,Luo Muchang.,...&Lin Lanying.(2003).Heteroepitaxial Growth and Heterojunction Characteristics of Voids-Free n-3C-SiC on p-Si(100).半导体学报,24(6),567-573.
MLA Sun Guosheng,et al."Heteroepitaxial Growth and Heterojunction Characteristics of Voids-Free n-3C-SiC on p-Si(100)".半导体学报 24.6(2003):567-573.

入库方式: OAI收割

来源:半导体研究所

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