Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes
文献类型:期刊论文
| 作者 | Guo CF; Chen Y(陈艳) ; Tang L; Wang F ; Ren ZF
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| 刊名 | NANO LETTERS
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| 出版日期 | 2016-01 |
| 卷号 | 16期号:1页码:594-600 |
| 通讯作者邮箱 | zren@uh.edu |
| 关键词 | Scratch resistance Au-S bond stretchability localized rupture stretchable transparent electrodes |
| ISSN号 | 1530-6984 |
| 产权排序 | [Guo, Chuan Fei; Tang, Lu; Wang, Feng; Ren, Zhifeng] Univ Houston, Dept Phys, Houston, TX 77204 USA; [Guo, Chuan Fei; Tang, Lu; Wang, Feng; Ren, Zhifeng] Univ Houston, TcSUH, Houston, TX 77204 USA; [Chen, Yan] Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China |
| 通讯作者 | Ren, ZF (reprint author), Univ Houston, Dept Phys, 3201 Cullen Blvd, Houston, TX 77204 USA. |
| 中文摘要 | Stretchable transparent electrodes are key elements in flexible electronics and e-skins. However, existing stretchable transparent electrodes, including graphene sheets, carbon nanotube, and metal nanowire networks, weakly adheres to the substrate by van der Waals forces. Such electrodes suffer from poor scratch-resistance or poor durability, and this issue has been one of the biggest problems for their applications in industry. Here we show that, by introducing a Au-S bond between a Au nanomesh (AuNM) and the underlying elastomeric substrate, the AuNM strongly adheres to the substrate and can withstand scratches of a pressure of several megapascals. We find that the strong chemical bond, on the other hand, leads to a stiffening effect and localized rupture of the AuNM upon stretching; thus the stretchability is poor. A prestraining process is applied to suppress the localized rupture and has successfully improved the stretchability: electrical resistance of the prestrained AuNM exhibits modest change by one-time stretching to 160%, or repeated stretching to 50% for 25 000 cycles. This conductor is an ideal platform for robust stretchable photoelectronics. The idea of introducing a covalent bond to improve the scratch-resistance may also be applied to other systems including Ag nanowire films, carbon nanotube films, graphene, and so forth. |
| 分类号 | 一类 |
| 类目[WOS] | Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 关键词[WOS] | SELF-ASSEMBLED MONOLAYERS ; SILICON SURFACE ; NETWORK ; GOLD ; FILMS ; NANOWIRES ; DEVICES ; UNIFORM ; CELLS |
| 收录类别 | SCI ; EI |
| 原文出处 | http://dx.doi.org/10.1021/acs.nanolett.5b04290 |
| 语种 | 英语 |
| WOS记录号 | WOS:000368322700091 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/58643] ![]() |
| 专题 | 力学研究所_非线性力学国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Guo CF,Chen Y,Tang L,et al. Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes[J]. NANO LETTERS,2016,16(1):594-600. |
| APA | Guo CF,陈艳,Tang L,Wang F,&Ren ZF.(2016).Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes.NANO LETTERS,16(1),594-600. |
| MLA | Guo CF,et al."Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes".NANO LETTERS 16.1(2016):594-600. |
入库方式: OAI收割
来源:力学研究所
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