Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain
文献类型:期刊论文
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作者 | Genquan Han; Yibo Wang; Yan Liu; Hongjuan Wang; Mingshan Liu; Chunfu Zhang; Jincheng Zhang; Buwen Cheng; Yue Hao |
刊名 | aip advances
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出版日期 | 2015 ; 2015 |
卷号 | 5页码:057145 |
学科主题 | 光电子学 ; 光电子学 |
收录类别 | SCI |
语种 | 英语 ; 英语 |
公开日期 | 2016-03-22 ; 2016-03-22 |
源URL | [http://ir.semi.ac.cn/handle/172111/26676] ![]() |
专题 | 半导体研究所_光电子研究发展中心 |
推荐引用方式 GB/T 7714 | Genquan Han,Yibo Wang,Yan Liu,et al. Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain, Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain[J]. aip advances, AIP ADVANCES,2015, 2015,5, 5:057145, 057145. |
APA | Genquan Han.,Yibo Wang.,Yan Liu.,Hongjuan Wang.,Mingshan Liu.,...&Yue Hao.(2015).Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain.aip advances,5,057145. |
MLA | Genquan Han,et al."Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain".aip advances 5(2015):057145. |
入库方式: OAI收割
来源:半导体研究所
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