中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain

文献类型:期刊论文

;
作者Genquan Han; Yibo Wang; Yan Liu; Hongjuan Wang; Mingshan Liu; Chunfu Zhang; Jincheng Zhang; Buwen Cheng; Yue Hao
刊名aip advances ; AIP ADVANCES
出版日期2015 ; 2015
卷号5页码:057145
学科主题光电子学 ; 光电子学
收录类别SCI
语种英语 ; 英语
公开日期2016-03-22 ; 2016-03-22
源URL[http://ir.semi.ac.cn/handle/172111/26676]  
专题半导体研究所_光电子研究发展中心
推荐引用方式
GB/T 7714
Genquan Han,Yibo Wang,Yan Liu,et al. Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain, Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain[J]. aip advances, AIP ADVANCES,2015, 2015,5, 5:057145, 057145.
APA Genquan Han.,Yibo Wang.,Yan Liu.,Hongjuan Wang.,Mingshan Liu.,...&Yue Hao.(2015).Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain.aip advances,5,057145.
MLA Genquan Han,et al."Relaxed germanium-tin P-channel tunneling field-effect transistors fabricated on Si: impacts of Sn composition and uniaxial tensile strain".aip advances 5(2015):057145.

入库方式: OAI收割

来源:半导体研究所

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