Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching
文献类型：期刊论文
| ; | |
| 作者 | Wanyong Li; Yi Luo; Bing Xiong; Changzheng Sun; Lai Wang; Jian Wang; Yanjun Han; Jianchang Yan; Tongbo Wei; Hongxi Lu |
| 刊名 | physica status solidi a
 ; Physica Status Solidi A
|
| 出版日期 | 2015 ; 2015 |
| 卷号 | 212期号:10页码:2341–2344 |
| 学科主题 | 半导体器件 ; 半导体器件 |
| 收录类别 | SCI |
| 语种 | 英语 ; 英语 |
| 公开日期 | 2016-04-15 ; 2016-04-15 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/27003]  |
| 专题 | 半导体研究所_中科院半导体照明研发中心 |
| 推荐引用方式 GB/T 7714 | Wanyong Li,Yi Luo,Bing Xiong,et al. Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching, Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching[J]. physica status solidi a, Physica Status Solidi A,2015, 2015,212, 212(10):2341–2344, 2341–2344. |
| APA | Wanyong Li.,Yi Luo.,Bing Xiong.,Changzheng Sun.,Lai Wang.,...&Hongxi Lu.(2015).Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching.physica status solidi a,212(10),2341–2344. |
| MLA | Wanyong Li,et al."Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching".physica status solidi a 212.10(2015):2341–2344. |
入库方式： OAI收割
来源：半导体研究所
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