Structure and magnetic properties of Ni-doped AlN films
文献类型：期刊论文
| 作者 | Pan, D; Jian, JK; Ablat, A; Li, J; Sun, YF; Wu, R |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2012 |
| 卷号 | 112期号:5页码:53911 |
| 英文摘要 | We report the crystal structure and magnetic properties of Al1-xNixN films with 0 <= x <= 0.032 deposited on Si (100) substrates by radio frequency reactive sputtering. X-ray diffractometry, x-ray photoemission spectroscopy, and x-ray absorption fine structure analysis clearly showed that Ni atoms were successfully incorporated into AlN, while the crystal structure of the films was maintained. All the doped samples exhibited ferromagnetism both at 5 K and 300 K. The saturation magnetizations (M-s) and coercive fields (H-c) tended to decrease as Ni concentration increased from 0.019 to 0.032, the maximum M-s obtained at 5 K and 300 K were about 0.025 and 0.014 emu/g, respectively, and the corresponding H-c were 208 and 60 Oe. Temperature dependence of remanent magnetization showed that the ferromagnetic transition temperature was beyond 300 K. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4749408] |
| 学科主题 | Physics |
| 收录类别 | SCI |
| WOS记录号 | WOS:000309072200088 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/224558]  |
| 专题 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Pan, D,Jian, JK,Ablat, A,et al. Structure and magnetic properties of Ni-doped AlN films[J]. JOURNAL OF APPLIED PHYSICS,2012,112(5):53911. |
| APA | Pan, D,Jian, JK,Ablat, A,Li, J,Sun, YF,&Wu, R.(2012).Structure and magnetic properties of Ni-doped AlN films.JOURNAL OF APPLIED PHYSICS,112(5),53911. |
| MLA | Pan, D,et al."Structure and magnetic properties of Ni-doped AlN films".JOURNAL OF APPLIED PHYSICS 112.5(2012):53911. |
入库方式： OAI收割
来源：高能物理研究所
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