Fullerene film on metal surface: Diffusion of metal atoms and interface model
文献类型：期刊论文
| 作者 | Li, WJ; Wang, P; Wang, XX; Wang, JO; Wu, R; Qian, HJ; Ibrahim, K; Li, HY; Li, HN;王嘉鸥; Wu R(吴蕊)
|
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 出版日期 | 2014 |
| 卷号 | 104期号:19页码:191606 |
| 英文摘要 | We try to understand the fact that fullerene film behaves as n-type semiconductor in electronic devices and establish a model describing the energy level alignment at fullerene/metal interfaces. The C-60/Ag(100) system was taken as a prototype and studied with photoemission measurements. The photoemission spectra revealed that the Ag atoms of the substrate diffused far into C-60 film and donated electrons to the molecules. So the C-60 film became n-type semiconductor with the Ag atoms acting as dopants. The C-60/Ag(100) interface should be understood as two sub-interfaces on both sides of the molecular layer directly contacting with the substrate. One sub-interface is Fermi level alignment, and the other is vacuum level alignment. (C) 2014 AIP Publishing LLC. |
| 学科主题 | Physics |
| 收录类别 | SCI |
| WOS记录号 | WOS:000336918600018 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/224827]  |
| 专题 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Li, WJ,Wang, P,Wang, XX,et al. Fullerene film on metal surface: Diffusion of metal atoms and interface model[J]. APPLIED PHYSICS LETTERS,2014,104(19):191606. |
| APA | Li, WJ.,Wang, P.,Wang, XX.,Wang, JO.,Wu, R.,...&奎热西.(2014).Fullerene film on metal surface: Diffusion of metal atoms and interface model.APPLIED PHYSICS LETTERS,104(19),191606. |
| MLA | Li, WJ,et al."Fullerene film on metal surface: Diffusion of metal atoms and interface model".APPLIED PHYSICS LETTERS 104.19(2014):191606. |
入库方式： OAI收割
来源：高能物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。