SIMULATION OF RELATIONSHIPS BETWEEN SUBSTRATE XRF INTENSITIES AND FILM THICKNESSES
文献类型：期刊论文
| 作者 | Fan QM(范钦敏); FAN, QM |
| 刊名 | X-RAY SPECTROMETRY
 |
| 出版日期 | 1993 |
| 卷号 | 22期号:1页码:11-12 |
| 通讯作者 | FAN, QM (reprint author), INST HIGH ENERGY PHYS,BEIJING 100080,PEOPLES R CHINA. |
| 英文摘要 | A Monte Carlo method was used to simulate relationships between substrate XRF intensities and film thicknesses for nickel film- and tin film-substrate systems. Experimental measurements of these relationships were performed for a few film-substrate systems. Good agreement between simulated and experimental values was obtained. |
| 学科主题 | Spectroscopy |
| 类目[WOS] | Spectroscopy |
| 收录类别 | SCI |
| WOS记录号 | WOS:A1993KJ58000002 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/225482]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Fan QM,FAN, QM. SIMULATION OF RELATIONSHIPS BETWEEN SUBSTRATE XRF INTENSITIES AND FILM THICKNESSES[J]. X-RAY SPECTROMETRY,1993,22(1):11-12. |
| APA | 范钦敏,&FAN, QM.(1993).SIMULATION OF RELATIONSHIPS BETWEEN SUBSTRATE XRF INTENSITIES AND FILM THICKNESSES.X-RAY SPECTROMETRY,22(1),11-12. |
| MLA | 范钦敏,et al."SIMULATION OF RELATIONSHIPS BETWEEN SUBSTRATE XRF INTENSITIES AND FILM THICKNESSES".X-RAY SPECTROMETRY 22.1(1993):11-12. |
入库方式： OAI收割
来源：高能物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。