Study on new type LIGA mask fabrication technique
文献类型：期刊论文
| 作者 | Chen, D; Zhu, J; Lei, W; Wang, S; Zhang, DC; Yi, FT; Yi FT(伊福廷)
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| 刊名 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
 |
| 出版日期 | 2001 |
| 卷号 | 25页码:#REF! |
| 关键词 | LIGA mask ICP deepetching LIGA technique |
| 其他题名 | 新型LIGA掩模板制造工艺研究 |
| 通讯作者 | Chen, D (reprint author), Shanghai Jiao Tong Univ, Inst Micro Nanometer Sci & Technol, Shanghai 200030, Peoples R China. |
| 英文摘要 | The fabrication of LIGA masks is a critical and challenging process in LIGA technique. As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching, we fabricated a new type LIGA mask using this technique. In comparison with other types of LIGA masks, the mask we fabricated has the advantages of its low cost and its simple fabrication process. Desired microstructures have also been fabricated using this new type LIGA mask in LIGA technique. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Nuclear ; Physics, Particles & Fields |
| 收录类别 | SCI |
| WOS记录号 | WOS:000176377600027 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/226390]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Chen, D,Zhu, J,Lei, W,et al. Study on new type LIGA mask fabrication technique[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2001,25:#REF!. |
| APA | Chen, D.,Zhu, J.,Lei, W.,Wang, S.,Zhang, DC.,...&伊福廷.(2001).Study on new type LIGA mask fabrication technique.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,25,#REF!. |
| MLA | Chen, D,et al."Study on new type LIGA mask fabrication technique".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 25(2001):#REF!. |
入库方式： OAI收割
来源：高能物理研究所
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