Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application
文献类型：期刊论文
| 作者 | Xie, CQ; Niu, JB; Wang, DQ; Dong, LJ; Chen, DP; Yi, FT; Zhang, JF; Yi FT(伊福廷) ; Zhang JF(张菊芳)
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| 刊名 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
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| 出版日期 | 2005 |
| 卷号 | 29页码:#REF! |
| 关键词 | proximity X-ray lithography X-ray mask TaSi film inductively coupled plasma synchrotron radiation |
| 其他题名 | 氮化硅/钽硅X射线光刻掩膜研制与应用 |
| 通讯作者 | Xie, CQ (reprint author), Chinese Acad Sci, Inst Microelect, Key Lab Nanofabricat & Novel Devices Integrated T, Beijing 100010, Peoples R China. |
| 英文摘要 | After more than 30 years research and Development, Proximity X-ray lithography has matured considerably and it has many advantages, such as high resolution, long depth of focus, large process latitude, high throughout and so on. For X-ray mask absorber, if Au. metal is selected, it can only be plated and may pollute the silicon-based integrated circuits. TaSi film can be dry etching and does not pollute the silicon-based integrated circuits, it is a potential candidate for X-ray mask absorber. In this paper, the home-made silicon nitride /TaSi X-ray mask fabrication process is described, unlike the conventional fabrication process, after e-beam exposure and development, is etched Inductively Coupled Plasma(ICP) etching based on SF6/CHF3 gas chemistries is used to pattern the TaSi film, using ZEP520 e-beam resist as the barrier layer directly. Primary experimental result demonstrated this X-ray mask fabrication process is feasible. |
| 学科主题 | Physics |
| 类目[WOS] | Physics, Nuclear ; Physics, Particles & Fields |
| 收录类别 | SCI |
| WOS记录号 | WOS:000234206900037 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/226457]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Xie, CQ,Niu, JB,Wang, DQ,et al. Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29:#REF!. |
| APA | Xie, CQ.,Niu, JB.,Wang, DQ.,Dong, LJ.,Chen, DP.,...&张菊芳.(2005).Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29,#REF!. |
| MLA | Xie, CQ,et al."Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29(2005):#REF!. |
入库方式： OAI收割
来源：高能物理研究所
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