Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence
文献类型：期刊论文
| 作者 | Fan QM(范钦敏); Liu YW(刘亚雯); Wei CL(魏诚林); Fan, QM; Liu, YW; Wei, CL |
| 刊名 | FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY
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| 出版日期 | 1996 |
| 卷号 | 354期号:2页码:#REF! |
| 通讯作者 | Fan, QM (reprint author), ACAD SINICA,INST HIGH ENERGY PHYS,POB 2732,BEIJING 100080,PEOPLES R CHINA. |
| 英文摘要 | Depth profiling of iron impurities on GaAs surfaces is performed by means of total reflection X-ray fluorescence. A numerical processing procedure presented previously is used for the evaluation of the experimental data. A detection limit of 10(11) atoms Fe/cm(2) on GaAs surfaces has been achieved. |
| 学科主题 | Chemistry |
| 类目[WOS] | Chemistry, Analytical |
| 收录类别 | SCI |
| WOS记录号 | WOS:A1996TR64200012 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/226835]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Fan QM,Liu YW,Wei CL,et al. Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence[J]. FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY,1996,354(2):#REF!. |
| APA | 范钦敏,刘亚雯,魏诚林,Fan, QM,Liu, YW,&Wei, CL.(1996).Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence.FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY,354(2),#REF!. |
| MLA | 范钦敏,et al."Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence".FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY 354.2(1996):#REF!. |
入库方式： OAI收割
来源：高能物理研究所
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