Effect of the convergence of Cu cap on the structure of Co/Cu(111) film
文献类型：期刊论文
| 作者 | Wang, Y; Li, XW; Jia, JF; Ji, H; Yang, Y; Bahar, HG; Wu, SC; Zhao, RG |
| 刊名 | SURFACE SCIENCE
 |
| 出版日期 | 1997 |
| 卷号 | 375期号:2-3页码:#REF! |
| 关键词 | Auger electron spectroscopy cobalt copper low energy electron diffraction (LEED) surface structure |
| 英文摘要 | Annealing Cu(111) covered with more than 10 ML Co film results in substrate Cu atoms diffusing through the Co film, and forming a Cu overlayer capping the Co him. Through AES and LEED experiments and QKLEED calculation, we found that the coverage of the Cu cap has an important effect on the top layers of the Co film. When the coverage of the Cu cap is less than 0.7 ML, the stacking sequence of the top layers is hcp, the same as that of Co film. When the coverage of the Cu cap is more than 1 ML, the top layers become fee and present twinned fee because of stacking on hcp Co him. This tends to explain the results of Co/Cu(111) superlattice studies in which Co show a fee stacking sequence. (C) 1997 Elsevier Science B.V. |
| 学科主题 | Chemistry; Physics |
| 类目[WOS] | Chemistry, Physical ; Physics, Condensed Matter |
| 收录类别 | SCI |
| WOS记录号 | WOS:A1997WU47200014 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/227058]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Wang, Y,Li, XW,Jia, JF,et al. Effect of the convergence of Cu cap on the structure of Co/Cu(111) film[J]. SURFACE SCIENCE,1997,375(2-3):#REF!. |
| APA | Wang, Y.,Li, XW.,Jia, JF.,Ji, H.,Yang, Y.,...&Zhao, RG.(1997).Effect of the convergence of Cu cap on the structure of Co/Cu(111) film.SURFACE SCIENCE,375(2-3),#REF!. |
| MLA | Wang, Y,et al."Effect of the convergence of Cu cap on the structure of Co/Cu(111) film".SURFACE SCIENCE 375.2-3(1997):#REF!. |
入库方式： OAI收割
来源：高能物理研究所
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