中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques

文献类型:期刊论文

作者Xiang; QY; Zhang; K; Wang; Y; Lou; XJ; Yao; WQ
出版日期2015
卷号7期号:49页码:27351-27356
关键词Pb(Zr metal/oxide interface metal-hydrogenation detaching method thickness dependence targeted interface engineering Ti)O-3 ferroelectric thin films
英文摘要Connections between metals and heterogeneous solid state materials form buried interfaces. These ubiquitous structures play an essential role in determining the performances of many nano- and microdevices. However, the information about the chemistry, structure, and properties of these real interfaces is intrinsically difficult to extract by traditional techniques. Therefore, approaches to efficiently discovering metalized interfaces are in high demand. Here, we demonstrate the transformation of nanoscale metal/oxide interface problems into surface problems through a novel metal-hydrogenation detaching method. We applied this technique to study the thickness dependence in Pb(Zr,Ti)O-3 (PZT) ferroelectric thin films, a long-standing interface problem in a model metal/insulator device,(1-6) and this allowed comprehensive surface analytical techniques to be adapted. A nonstoichiometric interfacial layer of 4.1 nm thick with low mass density, low permittivity, and weak ferro electricity was quantified at the Pt/PZT interface and attributed to the preferential diffusions among the compositional elements. Targeted interface engineering by Pb rebalance led to a substantial recovery of ferroelectric properties. Our results therefore pave the way to a better understanding of metallized interface in ferroelectric and dielectric nanodevices. We hope that more useful information about metalized interfaces of other solid materials could, analogously, be accessed by surface analytical techniques.
学科主题Science & Technology - Other Topics; Materials Science
类目[WOS]Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
收录类别SCI ; EI
WOS记录号WOS:000366873900038
公开日期2016-05-03
源URL[http://ir.ihep.ac.cn/handle/311005/229109]  
专题高能物理研究所_多学科研究中心
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GB/T 7714
Xiang,QY,Zhang,et al. Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques[J],2015,7(49):27351-27356.
APA Xiang.,QY.,Zhang.,K.,Wang.,...&王焕华.(2015).Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques.,7(49),27351-27356.
MLA Xiang,et al."Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques".7.49(2015):27351-27356.

入库方式: OAI收割

来源:高能物理研究所

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