Fabrication of fused silica phase gratings with inductively coupled plasma technology
文献类型：期刊论文
| 作者 | Wang SQ(王顺权) ; Zhou CH(周常河) ; Ru HY(茹华一) ; Zhang YY(张妍妍) |
| 刊名 | chin. opt. lett.
 |
| 出版日期 | 2005 |
| 卷号 | 3期号:s1页码:79 |
| ISSN号 | 1671-7694 |
| 中文摘要 | inductively coupled plasma (icp) technology is a new advanced version of dry-etching technology compared with the widely used method of reactive ion etching (rie). plasma processing of the icp technology is complicated due to the mixed reactions among discharge physics, chemistry and surface chemistry. extensive experiments have been done and microoptical elements have been fabricated successfully, which proved that the icp technology is very effective in dry etching of microoptical elements. in this paper, we present the detailed fabrication of microoptical fused silica phase gratings with icp technology. optimized condition has been found to control the etching process of icp technology and to improve the etching quality of microoptical elements greatly. with the optimized condition, we have fabricated lots of good gratings with different periods, depths, and duty cycles. the fabricated gratings are very useful in fields such as spectrometer, high-efficient filter in wavelength-division-multiplexing system, etc.. |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/1770]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Wang SQ,Zhou CH,Ru HY,et al. Fabrication of fused silica phase gratings with inductively coupled plasma technology[J]. chin. opt. lett.,2005,3(s1):79, 81. |
| APA | 王顺权,周常河,茹华一,&张妍妍.(2005).Fabrication of fused silica phase gratings with inductively coupled plasma technology.chin. opt. lett.,3(s1),79. |
| MLA | 王顺权,et al."Fabrication of fused silica phase gratings with inductively coupled plasma technology".chin. opt. lett. 3.s1(2005):79. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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