Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature
文献类型：期刊论文
| 作者 | Xiao, Y; Gao, FY; Dong, GB; Guo, TT; Liu, QR; Ye, D; Diao, XG;叶笛 |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2014 |
| 卷号 | 556页码:155-159 |
| 关键词 | Indium tin oxide Facing target sputtering Transparent conductors Polyethylene terephthalate |
| 英文摘要 | Indium tin oxide (ITO) thin films were deposited on polyethylene terephthalate substrates using a DC facing target sputtering (DC-FTS) system at room temperature. The sputtering conditions including oxygen partial pressure and discharge current were varied from 0% to 4% and 0.5 A to 1.3 A, respectively. X-ray diffraction and scanning electron microscopy were used to study the structure and surface morphology of as-prepared films. All the films exhibited amorphous structures and smooth surfaces. The dependence of electrical and optical properties on various deposition parameters was investigated by a linear array four-point probe, Hall-effect measurements, and ultraviolet/visible spectrophotometry. A lowest sheet resistance of 17.4 Omega/square, a lowest resistivity of 3.61 x 10(-4) Omega cm, and an average relative transmittance over 88% in the visible range were obtained under the optimal deposition conditions. The relationship between the Hall mobility (mu) and carrier concentration (n) was interpreted by a functional relation of mu similar to n(-0.127), which indicated that ionized donor scattering was the dominant electron scattering mechanism. It is also confirmed that the carrier concentration in ITO films prepared by the DC-FTS system is mainly controlled by the number of activated Sn donors rather than oxygen vacancies. (C) 2014 Elsevier B. V. All rights reserved. |
| 学科主题 | Materials Science; Physics |
| 收录类别 | SCI |
| WOS记录号 | WOS:000333085700025 |
| 公开日期 | 2016-05-03 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/225382]  |
| 专题 | 高能物理研究所_实验物理中心 |
| 推荐引用方式 GB/T 7714 | Xiao, Y,Gao, FY,Dong, GB,et al. Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature[J]. THIN SOLID FILMS,2014,556:155-159. |
| APA | Xiao, Y.,Gao, FY.,Dong, GB.,Guo, TT.,Liu, QR.,...&Diao, XG；叶笛.(2014).Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature.THIN SOLID FILMS,556,155-159. |
| MLA | Xiao, Y,et al."Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature".THIN SOLID FILMS 556(2014):155-159. |
入库方式： OAI收割
来源：高能物理研究所
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