Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools
文献类型：期刊论文
| 作者 | Wang Fan ; Wang XC(王向朝) ; Ma MY(马明英) |
| 刊名 | appl. optics
 |
| 出版日期 | 2006 |
| 卷号 | 45期号:24页码:6086 |
| ISSN号 | 0003-6935 |
| 关键词 | LENS ABERRATIONS METROLOGY ALIGNMENT IMAGE |
| 中文摘要 | as the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. we propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. the experiments are performed to measure the aberrations of projection optics in an arf scanner. (c) 2006 optical society of america. |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000239859400005 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/1800]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Wang Fan,Wang XC,Ma MY. Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools[J]. appl. optics,2006,45(24):6086, 6093. |
| APA | Wang Fan,王向朝,&马明英.(2006).Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools.appl. optics,45(24),6086. |
| MLA | Wang Fan,et al."Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools".appl. optics 45.24(2006):6086. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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