X-ray nonspecular scattering from amorphous Mo films
文献类型:期刊论文
作者 | Ma HJ(马宏骥); Jiang XM(姜晓明)![]() ![]() ![]() |
刊名 | CHINESE PHYSICS LETTERS
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出版日期 | 1997 |
卷号 | 14期号:3页码:#REF! |
通讯作者 | Ma, HJ (reprint author), CHINESE ACAD SCI,INST HIGH ENERGY PHYS,BEIJING 100039,PEOPLES R CHINA. |
英文摘要 | X-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures, The results show that with the increase of Ar pressure, the density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abnormal glow discharging in the sputtering processes interprets the observed results well. |
学科主题 | Physics |
类目[WOS] | Physics, Multidisciplinary |
收录类别 | SCI |
WOS记录号 | WOS:A1997XA76400009 |
公开日期 | 2016-05-03 |
源URL | [http://ir.ihep.ac.cn/handle/311005/226812] ![]() |
专题 | 高能物理研究所_院士 |
推荐引用方式 GB/T 7714 | Ma HJ,Jiang XM,Cui MQ,et al. X-ray nonspecular scattering from amorphous Mo films[J]. CHINESE PHYSICS LETTERS,1997,14(3):#REF!. |
APA | 马宏骥.,姜晓明.,崔明启.,冼鼎昌.,Ma, HJ.,...&Xian, DC.(1997).X-ray nonspecular scattering from amorphous Mo films.CHINESE PHYSICS LETTERS,14(3),#REF!. |
MLA | 马宏骥,et al."X-ray nonspecular scattering from amorphous Mo films".CHINESE PHYSICS LETTERS 14.3(1997):#REF!. |
入库方式: OAI收割
来源:高能物理研究所
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