中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Exciton and Carrier Spin Relaxations in InGaAs Lattice-matched to Ge Substrates

文献类型:期刊论文

作者Jianrong Dong(董建荣); Shulong Lu(陆书龙)
刊名Appl. Phys. Lett.
出版日期2012-06-18
卷号100期号:25页码:252414
通讯作者Atsushi Tackeuchi
英文摘要We have investigated the exciton and carrier spin relaxations in InGaAs lattice-matched to Ge substrates. Time-resolved spin-dependent pump and probe reflectance measurements revealed a
spin relaxation behavior between 10 and 300 K. The presence of the carrier density dependence of
spin relaxation time at 10-200K implies that the Bir-Aronov-Pikus process is effective. At 250-300 K, the strong temperature and weak carrier density dependences of spin relaxation time
show that the D’yakonov-Perel’ process is dominant. The longest observed spin relaxation time of 2.6 ns at 77K is explained by the decrease in the spatial overlap of electrons and holes.
收录类别SCI
语种英语
公开日期2013-01-16
源URL[http://58.210.77.100/handle/332007/923]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_SONY团队
苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_董建荣团队
推荐引用方式
GB/T 7714
Jianrong Dong,Shulong Lu. Exciton and Carrier Spin Relaxations in InGaAs Lattice-matched to Ge Substrates[J]. Appl. Phys. Lett.,2012,100(25):252414.
APA Jianrong Dong,&Shulong Lu.(2012).Exciton and Carrier Spin Relaxations in InGaAs Lattice-matched to Ge Substrates.Appl. Phys. Lett.,100(25),252414.
MLA Jianrong Dong,et al."Exciton and Carrier Spin Relaxations in InGaAs Lattice-matched to Ge Substrates".Appl. Phys. Lett. 100.25(2012):252414.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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