中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Room-temperature GaAs/InP wafer bonding with extremely low resistance

文献类型:期刊论文

作者Ji, L (季莲); Yang, H (杨辉); Lu, SL (陆书龙)
刊名APPLIED PHYSICS EXPRESS
出版日期2014
卷号7期号:11
关键词CONCENTRATOR SOLAR-CELLS
通讯作者Uchida, S (Uchida, Shiro)
英文摘要Low-temperature direct wafer bonding is a promising technique for fabricating multijunction solar cells with more than four junctions in order to obtain high conversion efficiencies. However, it has been difficult to reduce the bond interface resistance between a GaAs-based subcell wafer and an InP-based subcell wafer. We found that a novel bonding structure comprising heavily Zn-doped (1 x 10(19) cm(-3)) p(+)-GaAs and S-doped (3 x 10(18)cm(-3)) n-InP had an interface resistance of 2.5 x 10(-5) Omega.cm(2), which is the lowest value ever reported. This result suggests that the newly developed room-temperature wafer bonding technique has high potential to realize high-efficiency multijunction solar cells. (C) 2014 The Japan Society of Applied Physics 
收录类别SCI
语种英语
WOS记录号WOS:000346119500020
公开日期2015-02-03
源URL[http://ir.sinano.ac.cn/handle/332007/1846]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_SONY团队
推荐引用方式
GB/T 7714
Ji, L ,Yang, H ,Lu, SL . Room-temperature GaAs/InP wafer bonding with extremely low resistance[J]. APPLIED PHYSICS EXPRESS,2014,7(11).
APA Ji, L ,Yang, H ,&Lu, SL .(2014).Room-temperature GaAs/InP wafer bonding with extremely low resistance.APPLIED PHYSICS EXPRESS,7(11).
MLA Ji, L ,et al."Room-temperature GaAs/InP wafer bonding with extremely low resistance".APPLIED PHYSICS EXPRESS 7.11(2014).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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