Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching
文献类型：期刊论文
| 作者 | Zhang R(张瑞英)
|
| 刊名 | IEEE PHOTONICS TECHNOLOGY LETTERS
 |
| 出版日期 | 2008-11 |
| 卷号 | 20期号:21-24页码:1821-1823 |
| 关键词 | Active vertical coupler (AVC) asymmetrical double shallow ridge inductively coupled plasma (ICP)/ICP etching rectangular ring laser |
| 通讯作者 | Zhang R（张瑞英） |
| 合作状况 | 其它 |
| 英文摘要 | Loss-reduction in flexibly vertical coupled ring lasers is demonstrated through asymmetric double shallow ridge in the main ring area and inductively coupled plasma (ICP)/ICP cascade etching. Compared with the previous counterpart, the reduced threshold current and enhanced output power are obtained; coupling ratio is tuned from 27% to 1.5% when threshold current is varied from 60 to 80 mA. Single-mode lasing with sidemode-suppression ratio of 27 dB and quality factor of 13120 is achieved when I(c) = 1.5 mA, I(d) = 58 mA, which are nearly twofolds of that in the previous one. Such strategies can he widely employed to reduce loss in other vertical coupled photonic circuits. |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| 公开日期 | 2010-01-15 |
| 源URL | [http://58.210.77.100/handle/332007/176]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_董建荣团队 |
| 推荐引用方式 GB/T 7714 | Zhang R. Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2008,20(21-24):1821-1823. |
| APA | Zhang R.(2008).Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching.IEEE PHOTONICS TECHNOLOGY LETTERS,20(21-24),1821-1823. |
| MLA | Zhang R."Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching".IEEE PHOTONICS TECHNOLOGY LETTERS 20.21-24(2008):1821-1823. |
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