中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effects of substrate miscut on threading dislocation distribution in metamorphic GaInAs/AlInAs buffers

文献类型:期刊论文

作者Yang, H (杨辉); Yu, SZ (于淑珍); Dong, JR (董建荣); Zhao, YM (赵勇明)
刊名JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
出版日期2014-01
卷号25期号:1页码:581-585
关键词SURFACE-MORPHOLOGY STRAIN RELAXATION GAAS
通讯作者Dong, JR (董建荣)
英文摘要Metamorphic GaInAs/AlInAs buffers with a total mismatch of 2 % with respect to GaAs have been grown by metal organic chemical vapor deposition on GaAs substrates with miscuts of 2A degrees, 7A degrees and 15A degrees toward (111)A. The buffer grown on 2A degrees miscut substrate exhibits a dislocation pile-up formation which increases the threading dislocation density greatly. However, using 7A degrees and 15A degrees off substrates eliminates the dislocation pile-up and decreases the dislocation density by an order of magnitude compared with that on the 2A degrees substrate miscut, and the best crystalline quality of buffer is obtained on the 15A degrees substrate miscut. Experimental results show that the buffers grown on the 7A degrees and 15A degrees miscut substrate exhibit shallower trenches on the surface and a weaker strain field in the InGaAs cap layers, and these help to suppress the occurrence of dislocation pile-up, leading to a lower threading dislocation density.
收录类别SCI
语种英语
WOS记录号WOS:000329233600080
公开日期2014-12-01
源URL[http://ir.sinano.ac.cn/handle/332007/1606]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_董建荣团队
通讯作者Dong, JR (董建荣)
推荐引用方式
GB/T 7714
Yang, H ,Yu, SZ ,Dong, JR ,et al. Effects of substrate miscut on threading dislocation distribution in metamorphic GaInAs/AlInAs buffers[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2014,25(1):581-585.
APA Yang, H ,Yu, SZ ,Dong, JR ,&Zhao, YM .(2014).Effects of substrate miscut on threading dislocation distribution in metamorphic GaInAs/AlInAs buffers.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,25(1),581-585.
MLA Yang, H ,et al."Effects of substrate miscut on threading dislocation distribution in metamorphic GaInAs/AlInAs buffers".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 25.1(2014):581-585.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。