中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Control of threading dislocations by strain engineering in GaInP buffers grown on GaAs substrates

文献类型:期刊论文

作者Li, KL(李奎龙); Sun, YR(孙玉润); Dong, JR(董建荣); He, Y(何洋); Zeng, XL(曾徐路); Zhao, YM(赵勇明); Yu, SZ(于淑珍); Zhao, CY(赵春雨)
刊名THIN SOLID FILMS
出版日期2015
卷号593页码:5
关键词Metamorphic GaInP buffers Threading dislocations X-ray diffraction Strain relaxation Dislocation annihilation
通讯作者Li, KL
英文摘要High quality strain-relaxed In0.3Ga0.7As layers with threading dislocation density about 2 x 10(6) cm(-2) and root-mean-square surface roughness below 8.0 nm were obtained on GaAs substrates using compositionally undulating step-graded Ga-1 (-) xInxP (x = 0.48-0.78) buffers. The transmission electron microscopy results reveal that the conventional step-graded GaInP buffers produce high density dislocation pile-ups, which are induced by the blocking effect of the nonuniform misfit dislocation strain field and crosshatched surface on the gliding of threading dislocations. In contrast, due to strain compensation, insertion of the tensile GaInP layers decreases the surface roughness and promotes dislocation annihilation in the interfaces, and eventually reduces the threading dislocation density. This provides a promising way to achieve a virtual substrate with the desired lattice parameter for metamorphic device applications. (C) 2015 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
公开日期2016-05-03
源URL[http://ir.sinano.ac.cn/handle/332007/3285]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_董建荣团队
推荐引用方式
GB/T 7714
Li, KL,Sun, YR,Dong, JR,et al. Control of threading dislocations by strain engineering in GaInP buffers grown on GaAs substrates[J]. THIN SOLID FILMS,2015,593:5.
APA Li, KL.,Sun, YR.,Dong, JR.,He, Y.,Zeng, XL.,...&Zhao, CY.(2015).Control of threading dislocations by strain engineering in GaInP buffers grown on GaAs substrates.THIN SOLID FILMS,593,5.
MLA Li, KL,et al."Control of threading dislocations by strain engineering in GaInP buffers grown on GaAs substrates".THIN SOLID FILMS 593(2015):5.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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