中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Enhanced performance of p-GaN by Mg delta doping

文献类型:期刊论文

作者Zhang SM; Liu JP; Wang HB(王怀兵)
刊名JOURNAL OF CRYSTAL GROWTH
出版日期2007-06-01
卷号304期号:1页码:7-10
关键词delta doping dislocation density hole concentration LED GaN MOCVD
通讯作者Wang HB
合作状况其它
英文摘要The electrical and structural properties of Mg delta-doped GaN epilayers grown by MOCVD were investigated. Compared to uniform Mg-doping GaN layers, it has been shown that the delta-doping (delta-doping) process could suppress the dislocation density and enhance the p-type performance. The influence of pre-purge step on the structural properties of GaN was also investigated. The hole concentration of p-GaN decreases when using a pre-purge step. These results can be explained convincingly using a simple model of impurity incorporation under Ga-free growth condition.
收录类别SCI ; EI
语种英语
WOS记录号WOS:000247231900003
公开日期2010-01-15
源URL[http://58.210.77.100/handle/332007/168]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
推荐引用方式
GB/T 7714
Zhang SM,Liu JP,Wang HB. Enhanced performance of p-GaN by Mg delta doping[J]. JOURNAL OF CRYSTAL GROWTH,2007,304(1):7-10.
APA Zhang SM,Liu JP,&Wang HB.(2007).Enhanced performance of p-GaN by Mg delta doping.JOURNAL OF CRYSTAL GROWTH,304(1),7-10.
MLA Zhang SM,et al."Enhanced performance of p-GaN by Mg delta doping".JOURNAL OF CRYSTAL GROWTH 304.1(2007):7-10.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。