中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition

文献类型:期刊论文

作者Yang, H (杨辉); Zhang, BS (张宝顺); Zhang, SM (张书明)
刊名CHINESE PHYSICS B
出版日期2011-12
卷号20期号:12
关键词X-ray diffraction metalorganic chemical vapour deposition nitrides
通讯作者Zhao, DG
英文摘要In situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above a low-temperature GaN buffer layer on a c-plane sapphire substrate by metalorganic chemical vapour deposition. It is found that the lateral growth of the GaN islands and their coalescence are promoted in the initial growth stage if optimized nitridation time and temperature are selected when the substrate is pre-exposed to ammonia. As confirmed by atomic force microscopy observations, the quality of the GaN epilayers is closely dependent on the surface morphology of the nitridated buffer layer, especially grain size and nucleation density.
收录类别SCI ; EI
语种英语
WOS记录号WOS:000298493500061
公开日期2012-07-25
源URL[http://58.210.77.100/handle/332007/523]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
推荐引用方式
GB/T 7714
Yang, H ,Zhang, BS ,Zhang, SM . The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition[J]. CHINESE PHYSICS B,2011,20(12).
APA Yang, H ,Zhang, BS ,&Zhang, SM .(2011).The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition.CHINESE PHYSICS B,20(12).
MLA Yang, H ,et al."The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition".CHINESE PHYSICS B 20.12(2011).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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