中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Control of residual carbon concentration in GaN high electron mobility transistor and realization of high-resistance GaN grown by metal-organic chemical vapor deposition

文献类型:期刊论文

作者Yang H(杨辉)
刊名THIN SOLID FILMS
出版日期2014-08-01
卷号564期号:0页码:135-139
关键词Carbon impurity Metalorganic chemical vapor deposition High-resistance gallium nitride High electron mobility transistors
通讯作者Zhao, DG
英文摘要GaN films were grown by metal-organic chemical vapor deposition (MOCVD) under various growth conditions. The influences of MOCVD growth parameters, i.e., growth pressure, ammonia (NH3) flux, growth temperature, trimethyl-gallium flux and H-2 flux, on residual carbon concentration ([C]) were systematically investigated. Secondary ion mass spectroscopy measurements show that [C] can be effectively modulated by growth conditions. Especially, it can increase by reducing growth pressure up to two orders of magnitude. High-resistance (HR) GaN epilayer with a resistivity over 1.0 x 10(9) Omega center dot cm is achieved by reducing growth pressure. The mechanism of the formation of HR GaN epilayer is discussed. An AlxGa1-xN/GaN high electron mobility transistor structure with a HR GaN buffer layer and an additional low-carbon GaN channel layer is presented, exhibiting a high two dimensional electron gas mobility of 1815 cm(2)/Vs. (C) 2014 Elsevier B.V. All rights reserved.
收录类别SCI
语种英语
WOS记录号WOS:000340852200017
公开日期2014-12-02
源URL[http://ir.sinano.ac.cn/handle/332007/1635]  
专题苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队
推荐引用方式
GB/T 7714
Yang H. Control of residual carbon concentration in GaN high electron mobility transistor and realization of high-resistance GaN grown by metal-organic chemical vapor deposition[J]. THIN SOLID FILMS,2014,564(0):135-139.
APA Yang H.(2014).Control of residual carbon concentration in GaN high electron mobility transistor and realization of high-resistance GaN grown by metal-organic chemical vapor deposition.THIN SOLID FILMS,564(0),135-139.
MLA Yang H."Control of residual carbon concentration in GaN high electron mobility transistor and realization of high-resistance GaN grown by metal-organic chemical vapor deposition".THIN SOLID FILMS 564.0(2014):135-139.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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