Anomalous behaviour of photorefractive grating erasure owing to existence of both negative and positive carriers
文献类型：期刊论文
| 作者 | Zhu R(朱荣) ; Liu DA ; Guo YJ ; Chai ZF(柴志方) ; Liu LR(刘立人) |
| 刊名 | chin. phys. lett.
 |
| 出版日期 | 2006 |
| 卷号 | 23期号:6页码:1462 |
| 关键词 | INDUCED CHARGE-TRANSPORT HOLOGRAPHIC STORAGE CRYSTALS INTENSITIES ULTRAVIOLET LINBO3 |
| ISSN号 | 0256-307x |
| 中文摘要 | in linbo3:fe, anomalous behaviour of grating erasure is observed with different wavelenghts, i.e. rapid grating erasure in the short wavelength range, which deviates from the results predicted by the electron transport band model. the deviation is related to the coexistance of electrons and holes in photorefraction, and charge-transfer process including electrons and hole has been proposed. the electron and hole contributions to photo-excitation coefficient s of the fe centre on the wavelength. |
| 收录类别 | 0 |
| 语种 | 英语 |
| WOS记录号 | WOS:000238406300029 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/1834]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Zhu R,Liu DA,Guo YJ,et al. Anomalous behaviour of photorefractive grating erasure owing to existence of both negative and positive carriers[J]. chin. phys. lett.,2006,23(6):1462, 1465. |
| APA | 朱荣,Liu DA,Guo YJ,柴志方,&刘立人.(2006).Anomalous behaviour of photorefractive grating erasure owing to existence of both negative and positive carriers.chin. phys. lett.,23(6),1462. |
| MLA | 朱荣,et al."Anomalous behaviour of photorefractive grating erasure owing to existence of both negative and positive carriers".chin. phys. lett. 23.6(2006):1462. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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