Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate
文献类型:期刊论文
作者 | LiWei Liu(刘立伟)![]() ![]() ![]() |
刊名 | Chem. Lett
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出版日期 | 2012-11 |
卷号 | 41期号:12 |
通讯作者 | GeBo Pan (潘革波)* |
英文摘要 | An ammonia chemiresistor sensor is demonstrated on the basis of poly(3-hexylthiophene) film oxidized by nitrosonium hexafluorophosphate. The sensor gave a good response to ammonia, while was insensitive to a variety of organic vapors. The detection limit was estimated to be ca. 0.22 ppm. The redox reaction between ammonia and bipolarons was attributed to the sensor signals. |
收录类别 | 其他 |
语种 | 英语 |
公开日期 | 2013-01-23 |
源URL | [http://58.210.77.100/handle/332007/1067] ![]() |
专题 | 苏州纳米技术与纳米仿生研究所_学科交叉综合研究部_潘革波团队 |
通讯作者 | GeBo Pan (潘革波)*; GeBo Pan (潘革波)* |
推荐引用方式 GB/T 7714 | LiWei Liu,GeBo Pan ,GeBo Pan . Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate[J]. Chem. Lett,2012,41(12). |
APA | LiWei Liu,GeBo Pan ,&GeBo Pan .(2012).Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate.Chem. Lett,41(12). |
MLA | LiWei Liu,et al."Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate".Chem. Lett 41.12(2012). |
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