中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate

文献类型:期刊论文

作者LiWei Liu(刘立伟); GeBo Pan (潘革波)*; GeBo Pan (潘革波)*
刊名Chem. Lett
出版日期2012-11
卷号41期号:12
通讯作者GeBo Pan (潘革波)*
英文摘要An ammonia chemiresistor sensor is demonstrated on the basis of
poly(3-hexylthiophene) film oxidized by nitrosonium hexafluorophosphate. The sensor gave a good response to ammonia, while was insensitive to a variety of organic vapors. The detection limit was estimated to be ca. 0.22 ppm. The redox reaction between ammonia and bipolarons was attributed to the
sensor signals.
收录类别其他
语种英语
公开日期2013-01-23
源URL[http://58.210.77.100/handle/332007/1067]  
专题苏州纳米技术与纳米仿生研究所_学科交叉综合研究部_潘革波团队
通讯作者GeBo Pan (潘革波)*; GeBo Pan (潘革波)*
推荐引用方式
GB/T 7714
LiWei Liu,GeBo Pan ,GeBo Pan . Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate[J]. Chem. Lett,2012,41(12).
APA LiWei Liu,GeBo Pan ,&GeBo Pan .(2012).Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate.Chem. Lett,41(12).
MLA LiWei Liu,et al."Ammonia chemiresistor sensor based on poly-3-hexylthiophene film oxidized by nitrosonium hexafluorophosphate".Chem. Lett 41.12(2012).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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