中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Printable poly(methylsilsesquioxane) dielectric ink and its application in solution processed metal oxide thin-film transistors

文献类型:期刊论文

作者Wu, XZ(吴馨洲); Chen, Z(陈征); Zhou, T(周腾); Shao, SS(邵霜霜); Xie, ML(谢美兰); Song, MS(宋民顺); Cui, Z(崔铮)
刊名RSC ADVANCES
出版日期2015
卷号5期号:27页码:7
通讯作者Chen, Z (陈征)
英文摘要Thermally cross-linkable poly(methylsilsesquioxane) (PMSQ) has been investigated as a printable dielectric ink to make the gate insulator for solution processed metal oxide (IGZO) thin-film transistors by aerosol jet printing. It was found that by increasing the curing temperature from 150 to 200 degrees C, the dielectric constant and loss tangent of the printed PMSQ layer reduces dramatically. The mobility, leakage current and gate current of the PMSQ enabled thin-film transistor reduces accordingly, while the on/off ratio increases with the increase of curing temperature. An interfacial layer was introduced to further improve the on/off ratio to 3 x 10(5) and reduce the leakage current to 2.6 x 10(-10) A, which is the best result for the solution processed IGZO thin-film transistors using the PMSQ as the gate insulator at a curing temperature of only 150 degrees C. The study has demonstrated the feasibility of fabricating IGZO thin-film transistors by an all solution-based process.
收录类别SCI
语种英语
源URL[http://ir.sinano.ac.cn/handle/332007/3491]  
专题苏州纳米技术与纳米仿生研究所_印刷电子学部_崔铮团队
推荐引用方式
GB/T 7714
Wu, XZ,Chen, Z,Zhou, T,et al. Printable poly(methylsilsesquioxane) dielectric ink and its application in solution processed metal oxide thin-film transistors[J]. RSC ADVANCES,2015,5(27):7.
APA Wu, XZ.,Chen, Z.,Zhou, T.,Shao, SS.,Xie, ML.,...&Cui, Z.(2015).Printable poly(methylsilsesquioxane) dielectric ink and its application in solution processed metal oxide thin-film transistors.RSC ADVANCES,5(27),7.
MLA Wu, XZ,et al."Printable poly(methylsilsesquioxane) dielectric ink and its application in solution processed metal oxide thin-film transistors".RSC ADVANCES 5.27(2015):7.

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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