Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering
文献类型：期刊论文
| 作者 | Wang, Meihan ; Lei, Hao ; Wen, Jiaxing ; Long, Haibo ; Sawada, Yutaka ; Hoshi, Yoichi ; Uchida, Takayuki ; Hou, Zhaoxia |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2015 |
| 卷号 | 359页码:521-525 |
| 关键词 | Tungsten oxide thin films Magnetron sputtering Negative bias voltage (V-b) Structure Composition |
| ISSN号 | 0169-4332 |
| 通讯作者 | haolei@imr.ac.cn |
| 收录类别 | SCI |
| 资助信息 | National Natural Science Foundation of China [51302175]; Program for Liaoning Excellent Talents in University [LJQ2014132]; Technology Foundation for Selected Overseas Chinese Scholar; Ministry of Personnel of China; Natural Science Foundation of Liaoning Province of China [2013020132] |
| 语种 | 英语 |
| 公开日期 | 2016-04-21 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/74764]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Wang, Meihan,Lei, Hao,Wen, Jiaxing,et al. Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2015,359:521-525. |
| APA | Wang, Meihan.,Lei, Hao.,Wen, Jiaxing.,Long, Haibo.,Sawada, Yutaka.,...&Hou, Zhaoxia.(2015).Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering.APPLIED SURFACE SCIENCE,359,521-525. |
| MLA | Wang, Meihan,et al."Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering".APPLIED SURFACE SCIENCE 359(2015):521-525. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。